Huawei Technologies Co.,Ltd's Statement about IPR related to draft-chen-isis-ttz
Note: Updates to IPR disclosures must only be made by authorized representatives of the original submitters. Updates will automatically be forwarded to the current Patent Holder's Contact and to the Submitter of the original IPR disclosure.
I. Patent Holder/Applicant ("Patent Holder")
|Holder legal name||Huawei Technologies Co.,Ltd|
II. Patent Holder's Contact for License Application
|Holder contact name||Director of licensing|
|Holder contact email@example.com|
|Holder contact info|
III. IETF Document or Other Contribution to Which this IPR Disclosure Relates
IV. Disclosure of Patent Information
i.e., patents or patent applications required to be disclosed by RFC 8179
A. For granted patents or published pending patent applications, please provide the following information:
|Patent, Serial, Publication, Registration, or Application/File number(s)||
B. Does this disclosure relate to an unpublished pending patent application?:
|Has patent pending||No|
V. Licensing Declaration
The Patent Holder states that its position with respect to licensing any patent claims contained in the patent(s) or patent application(s) disclosed above that would necessarily be infringed by implementation of the technology required by the relevant IETF specification ("Necessary Patent Claims"), for the purpose of implementing such specification, is as follows(select one licensing declaration option only):
|Licensing||Reasonable and Non-Discriminatory License to All Implementers with Possible Royalty/Fee|
|Licensing information, comments, notes, or URL for further information||
(No information submitted)
Note: The individual submitting this template represents and warrants that he or she is authorized by the Patent Holder to agree to the above-selected licensing declaration.
VI. Contact Information of Submitter of this Form
|Submitter name||Director of licensing|
Only those sections of the relevant entry form where the submitter provided information are displayed above.